High Degree Reduction of Graphene Oxide toward a High Carrier Mobility
نویسندگان
چکیده
منابع مشابه
Effect of High-K Oxide Layer on Carrier Mobility
ABSTRACT: Over the past three decades CMOS has emerged as the basis of design in nanotechnology. MOSFETS provide an easier way of fabrication due to their ease of manufacturing and lower power consumption than the BJTs. However the use of high k materials to follow Moore’s Law, has created certain problems in the working of these devices. In this review we have dealt with the mobility related i...
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ژورنال
عنوان ژورنال: Journal of the Vacuum Society of Japan
سال: 2017
ISSN: 1882-2398,1882-4749
DOI: 10.3131/jvsj2.60.300